The capability currently exists to implant samples with up to a 2 inch diameter at substrate temperatures in the range -195oC to 600oC. Wafers of 3 and 4 inch diameter can currently be implanted at room temperature only. Dose uniformity is on the order of 3%. The temperature is monitored by 3 thermocouples imbedded in the nickel block.
© 1878 - Western University
